Items where Author is "Lockman, Z."

Article

Kurniawan, T. and Wong, Y.H. and Cheong, K.Y. and Moon, J.H. and Bahng, W. and Razak, K.A. and Lockman, Z. and Kim, H.J. and Kim, N.K. (2011) Effects of post- oxidation annealing temperature on ZrO2 thin film deposited on 4H-SiC substrate. Materials Science in Semiconductor Processing, 14 (1). pp. 13-17. ISSN 1369-8001, DOI https://doi.org/10.1016/j.mssp.2010.12.011.