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Bolzan, A.E. and Haseeb, A.S. Md. Abdul and Schilardi, P.L. and Piatti, Roberto C.V. and Salvarezza, Roberto Carlos and Arvia, Alejandro Jorge (2001) Anodisation of copper in thiourea- and formamidine disulphide-containing acid solution. part I. identification of products and reaction pathway. Journal of Electroanalytical Chemistry, 500 (1-2). pp. 533-542. ISSN 0022-0728, DOI https://doi.org/10.1016/S0022-0728(00)00217-5.
Haseeb, A.S. Md. Abdul and Schilardi, P.L. and Bolzan, A.E. and Piatti, R.C.V. and Salvarezza, R.C. and Arvia, A.J. (2001) Anodisation of copper in thiourea-containing acid solution - part II. in situ transversal imaging observations. kinetics of anodic film growth. Journal of Electroanalytical Chemistry, 500 (1-2). pp. 543-553. ISSN 0022-0728, DOI https://doi.org/10.1016/S0022-0728(00)00216-3.
