Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering

Hasan, M.M. and Haseeb, A.S. Md. Abdul and Saidur, Rahman and Masjuki, Haji Hassan and Hamdi, M. (2009) Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering. Journal of Applied Sciences, 9 (15). pp. 2815-2821. ISSN 1812-5654, DOI

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In this investigation, anatase TiO 2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. The TiO 2 films deposited at room temperature were annealed at different temperatures up to 873°K for 1 h. The TiO 2 films were characterized by X-Ray Diffraction (XRD), Field-Emission Scanning Electron Microscopy (FESEM). Atomic Force Microscopy (AFM) and UV-visible-NIR spectrophotometry. The XRD results reveal that the as-deposited film possess the anatase structure. Annealed TiO 2 films show an insignificant change in crystallinity except of the fact that there is a slight increase for the film annealed at 600°C. The crystallite size increases from 44.5 to 48 nm with the increase of the annealing temperature. As-grown TiO 2 film exhibits high visible transmittance with enhanced refractive index of 2.31 at a wavelength of 550 nm. The indirect optical band gaps of the as-deposited and annealed films have been estimated to be in the range of 3.39-3.42 eV. AFM observations reveal the compact and dense morphology of the as-deposited and annealed TiO 2 thin films.

Item Type: Article
Additional Information: Cited By (since 1996): 3 Export Date: 6 December 2012 Source: Scopus Language of Original Document: English Correspondence Address: Hasan, M. M.; Department of Mechanical Engineering, University of Malaya, 50603 Kuala Lumpur, Malaysia References: Akl, A.A., Kamal, H., Abdel-Hady, K., Fabrication and characterization of sputtered titanium dioxide films (2006) Applied Surf. Sci., 252, pp. 8651-8656; Amor, S.B., Baud, G., Jacquet, M., Pichon, N., Photoprotective tilania coatings on PET substrates (1998) Surf. Coat. Technol., 102, pp. 63-72; Eufinger, K., Poelman, D., Poelman, H., Gryse, R.D., Marin, G.B., Effect of microstructure and crystallinity on the photocatalytic activity of TiO 2 thin films deposited by DC magnetron sputtering (2007) J. Phys. D: Applied Phys., 40, pp. 5232-5238; Ghamsari, M.S., Bahramian, A.R., High transparent sol-gel derived nanostructured TiO 2 thin film (2008) Mat. Lett., 62, pp. 361-364; Habibi, M.H., Talebian, N., Choi, J.H., The effect of annealing on photocatalytic properties of nanostructured titanium dioxide thin films (2007) Dyes Pigments, 73, pp. 103-110; Heo, C.H., Lee, S.B., Boo, J.H., Deposition of TiO 2 thin films using RF magnetron sputtering method and study of their surface characteristics (2005) Thin Solid Films, 475, pp. 183-188; Horprathum, M., Chindaudom, P., Limsuwan, P., A spectroscopic ellipsometry study of TiO 2 thin films prepared by dc reactive magnetron sputtering: Annealing temperature effect (2007) Chin. Phys. Lett., 24, pp. 1505-1508; Hou, Y.Q., Zhuang, D.M., Zhang, G., Zhao, M., Wu, M.S., Influence of annealing temperature on the properties of titanium oxide thin film (2003) Applied Surf. Sci., 218, pp. 98-106; Karuppasamy, A., Subrahmanyam, A., Studies on the room temperature growth of nanoanatase phase TiO 2 thin films by pulsed dc magnetron with oxygen as sputter gas (2007) J. Applied Phys., 101, pp. 1-7; Nam, H.J., Amemiya, T., Murabayashi, M., Lion, K., Photocatalytic activity of sol-gel TiO 2 thin films on various kinds of glass substrates: The effects of Na + and primary particle size (2004) J. Phys. Chem. B, 108, pp. 8254-8259; Okada, M., Tazawa, M., Jin, P., Yamada, Y., Yoshimura, K., Fabrication of photocatalytic heat-mirror with TiO 2/TiN/ TiO 2 stacked layers (2006) Vacuum, 80, pp. 732-735; Pulker, H.K., (1999) Coatings on Glass, , 2nd Edn., Elsevier, Amsterdam. ISBN: 978-0-444-50103-5; Sun, H., Wang, C., Pang, S., Li, X., Tao, Y., Photocatalytic Ti02 films prepared by chemical vapor deposition at atmosphere pressure (2008) J. Non-Cryst. Solids, 354, pp. 1440-1443; Sung, Y.M., Kim, H.J., Sputter deposition and surface treatment of TiO 2 films for dye-sensitized solar cells using reactive RF plasma (2007) Thin Solid Films, 515, pp. 4996-4999; Swanepoel, R., Determination of the thickness and optical constants of amorphous silicon (1983) J. Phys. E Sci. Instrum., 16, pp. 1214-1222; Tauc, J., (1974) Amorphous and Liquid Semiconductors, , Plenum, London, ISBN: 0306307774; Tavares, C.J., Vieira, J., Rebouta, L., Hungerford, G., Coutinho, P., Reactive sputtering deposition of photocatalytic TiO 2 thin films on glass substrates (2007) Mater. Sci. Eng. B, 138, pp. 139-143; Tian, G., Wu., S., Shu, K., Qin, L., Shao, J., Influence of deposition conditions on the microstructure of oxides thin films (2007) Applied Surf. Sci., 253, pp. 8782-8787; Tomaszewski, H., Eufinger, K., Poelman, H., Poelman, D., Gryse, R.D., Effect of substrate sodium content on crystallization and photocatalytic activity of TiO 2 films prepared by dc magnetron sputtering (2007) Int. J. Photoenergy, 1, pp. 1-5; Wang, Z., Helmersson, U., Käll, P.O., Optical properties of anatase TiO 2 thin films prepared by aqueous sol-gel process at low temperature (2002) Thin Solid Films, 405, pp. 50-54; Yang, W., Wolden, C.A., Plasma-enhanced chemical vapor deposition of TiO 2 thin films for dielectric applications (2006) Thin Solid Films, 515, pp. 1708-1713; Yang, C., Fan, H., Xi, Y., Chen, J., Li, Z., Effects of depositing temperatures on structure and optical properties of TiO 2 film deposited by ion beam assisted electron beam evaporation (2008) Applied Surf. Sci., 254, pp. 2685-2689; Ye, Q., Liu, P.Y., Tang, Z.F., Zhai, L., Hydrophilic properties of nano-TiO 2 thin films deposited by RF magnetron sputtering (2007) Vacuum, 81, pp. 627-631; Zheng, S.K., Xiang, G., Wang, T.M., Pan, F., Wang, C., Photocatalytic activity studies of TiO 2 thin films prepared by r.f. magnetron reactive sputtering (2004) Vacuum, 72, pp. 79-84
Uncontrolled Keywords: Heat-mirror coatings; Morphology; Optical properties; Structural properties
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
T Technology > TJ Mechanical engineering and machinery
Divisions: Faculty of Engineering
Depositing User: Mr Jenal S
Date Deposited: 08 Jul 2013 01:17
Last Modified: 21 Jul 2020 07:32

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