Methodology for Fabrication-Tolerant Planar Directional Couplers

Lai, Choon Kong and Zhong, Yile and Chong, Wu Yi and Choi, Duk-Yong and Ahmad, Harith and Madden, Stephen (2022) Methodology for Fabrication-Tolerant Planar Directional Couplers. IEEE Photonics Journal, 14 (3). ISSN 1943-0655, DOI

Full text not available from this repository.


A new methodology for realizing fabrication-tolerant planar directional couplers is proposed and experimentally demonstrated. Performance of power splitting and WDM couplers can be made highly tolerant to typical process errors when an appropriate center-to-center spacing is chosen due to changes in the mode area compensating waveguide edge to edge variation along a very specific design locus. Using this approach, 2-3% index contrast waveguide couplers were fabricated and tested, demonstrating the predicted improved fabrication tolerances. High index contrast silicon-on-insulator systems are also shown to exhibit the same mechanism. The high fabrication tolerance demonstrated is of particular importance for vertically stacked hybrid integration of different materials platforms, where achieving tight critical dimension control over significant physical topology is problematic. Additionally the method will be of utility in circumstances where tight tolerances are required on coupling ratios such as coupled resonator filter devices etc.

Item Type: Article
Funders: Australian Research Council [Grant No:LP150100914], UMRG [Grant No:RP029C-15AFR], Universiti Malaya, Australian National University, Malaysia Ministry of Education Longterm research [Grant No:LRGS(2015)/NGOD/UM/KPT], PPP research [Grant No:PG243-2016A], Australian National University, China Scholarship Council [Grant No:201606310180], Australian Research Council [Grant No:LP150100914]
Uncontrolled Keywords: Optical waveguides; Couplings; Optical device fabrication; Performance evaluation; Indexes; Directional couplers; Resists; Directional couplers; tolerance analysis; integrated optics; optical device fabrication; lithography
Subjects: Q Science > QC Physics
T Technology > TA Engineering (General). Civil engineering (General)
Divisions: Deputy Vice Chancellor (Research & Innovation) Office > Photonics Research Centre
Depositing User: Ms. Juhaida Abd Rahim
Date Deposited: 12 Oct 2023 04:13
Last Modified: 12 Oct 2023 04:13

Actions (login required)

View Item View Item