Atuchin, V.V. and Kruchinin, V.N. and Wong, Y.H. and Cheong, K.Y. (2013) Microstructural and optical properties of ZrON/Si thin films. Materials Letters, 105. pp. 72-75. ISSN 0167-577X, DOI https://doi.org/10.1016/j.matlet.2013.03.100.
Full text not available from this repository.Abstract
ZrON/Si(100) layer structure formation has been produced by oxidation/nitridation of sputtered Zr metal in N2O/Ar ambient at 500–900 °C. Micromorphology and structural properties of the films have been evaluated by scanning electron microscopy, atomic force microscopy, and reflection high-energy electron diffraction. Dispersive optical properties of the ZrON/Si reflection system have been studied with spectroscopic ellipsometry. A drastic increase of SiO2-based interface layer thickness has been found at 700–900 °C.
| Item Type: | Article |
|---|---|
| Funders: | UNSPECIFIED |
| Uncontrolled Keywords: | ZrON/Si structure; SEM; AFM; Spectroscopic ellipsometry |
| Subjects: | T Technology > TA Engineering (General). Civil engineering (General) |
| Divisions: | Faculty of Engineering |
| Depositing User: | Ms. Juhaida Abd Rahim |
| Date Deposited: | 11 Mar 2015 03:59 |
| Last Modified: | 11 Mar 2015 03:59 |
| URI: | http://eprints.um.edu.my/id/eprint/13006 |
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