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Rashid, N.M.A. and Ritikos, R. and Othman, M. and Khanis, N.H. and Gani, S.M.A. and Muhamad, M.R. and Rahman, S.A. (2013) Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. Power. Thin Solid Films, 529. pp. 459-463. ISSN 0040-6090 , DOI https://doi.org/10.1016/j.tsf.2012.09.032.