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Azmi, Nor Syafiqah and Mazlan, Muhammad Naim and Taib, Mohd Ikram Md and Ahmad, Mohd Anas and Samsuri, Mohd Shahrul Nizam and Mansor, Marwan and Hisyam, Muhammad Iznul and Abu Bakar, Ahmad Shuhaimi and Zainal, Norzaini (2024) Impact of nucleation temperature on growth uniformity of GaN on 4-inch dome-patterned sapphire substrate. Materials Science in Semiconductor Processing, 173. p. 108177. ISSN 1369-8001, DOI https://doi.org/10.1016/j.mssp.2024.108177.
Hisyam, Muhammad Iznul and Shuhaimi, Ahmad and Norhaniza, Rizuan and Mansor, Marwan and Williams, Adam and Hussin, Mohd Rofei Mat (2024) Study of AlN Epitaxial Growth on Si (111) Substrate Using Pulsed Metal-Organic Chemical Vapour Deposition. Crystals, 14 (4). p. 371. ISSN 2073-4352, DOI https://doi.org/10.3390/cryst14040371.
Abd Samad, Muhammad Izzuddin and Badrudin, Syazwani Izrah and Ponnuthurai, Darven Raj and Mansor, Marwan and Nayan, Nafarizal and Abu Bakar, Ahmad Shuhaimi and Latif, Rhonira (2024) Influence of argon/nitrogen sputtering gas and molybdenum/titanium seed layer on aluminium nitride (100) thin film growth using ceramic target. Journal of Materials Research and Technology-JMR&T, 29. pp. 2248-2257. ISSN 2238-7854, DOI https://doi.org/10.1016/j.jmrt.2024.01.286.
Samad, Muhammad Izzuddin Abd and Badrudin, Syazwani Izrah and Ponnuthurai, Darven Raj and Mansor, Marwan and Nayan, Nafarizal and Abu Bakar, Ahmad Shuhaimi and Latif, Rhonira (2024) Influence of argon/nitrogen sputtering gas and molybdenum/titanium seed layer on aluminium nitride ⟨100⟩ thin film growth using ceramic target. Journal of Materials Research and Technology-JMR&T, 29. pp. 2248-2257. ISSN 2238-7854, DOI https://doi.org/10.1016/j.jmrt.2024.01.286.
Abd Samad, Muhammad Izzuddin and Noor, Mimiwaty Mohd and Nayan, Nafarizal and Abu Bakar, Ahmad Shuhaimi and Mansor, Marwan and Zuhdi, Ahmad Wafi Mahmood and Hamzah, Azrul Azlan and Latif, Rhonira (2023) Effects of argon/nitrogen sputtering gas on the microstructural, crystallographic and piezoelectric properties of AlN thin films. Scripta Materialia, 226. ISSN 1359-6462, DOI https://doi.org/10.1016/j.scriptamat.2022.115228.
