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Khanis, N.H. and Ritikos, R. and Kamal, S.A.A. and Rahman, S.A. (2017) Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature. Materials, 10 (2). p. 102. ISSN 1996-1944, DOI https://doi.org/10.3390/ma10020102.