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Zhao, Feng and Amnuayphol, Oliver and Cheong, Kuan Yew and Wong, Yew Hoong and Jiang, Jheng-Yi and Huang, Chih-Fang (2019) Post deposition annealing effect on properties of Y2O3/Al2O3 stacking gate dielectric on 4H-SiC. Materials Letters, 245. pp. 174-177. ISSN 0167-577X, DOI https://doi.org/10.1016/j.matlet.2019.03.009.