Properties of a-C:H films deposited in CH4 H2 and CH4he DC plasma

Awang, R. and Rahman, S.A. (2009) Properties of a-C:H films deposited in CH4 H2 and CH4he DC plasma. International Journal of Nanoscience, 8 (1-2). pp. 15-18. ISSN 0219-581X, DOI

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Hydrogenated amorphous carbon (a-C:H) films were deposited using direct-current plasma enhanced chemical vapor deposition (DC PECVD) process. The resulting film properties were studied with respect to the introduction of hydrogen (H2) and helium (He) in methane (CH4) plasma. The analysis techniques used to assess the film properties included optical transmission spectroscopy, Fourier transmission infrared (FTIR) spectroscopy and photoluminescence (PL) spectroscopy. Hydrogen dilution has significant effect on the deposition rate and optical band gap (Eg) of the film but helium dilution produces insignificant effects on these parameters. However, the hydrogen content in the film decreases steeply to a saturation value with increase in helium dilution. Increase in dilution of CH4 by both H and He gases result in decrease in PL efficiency. © 2009 World Scientific Publishing Company.

Item Type: Article
Uncontrolled Keywords: A-C:H Eg FTIR Hydrogen and helium dilution PL a-C:H films Analysis techniques DC plasma Direct-current E<sub>g</sub> Film properties Fourier Helium dilution Hydrogen contents Hydrogen dilution Hydrogenated amorphous carbon (a-C:H) Optical transmission spectroscopy PL efficiency Saturation values Amorphous carbon Amorphous films Carbon films Dilution Fourier transform infrared spectroscopy Helium Hydrogen Methane Optical films Plasma deposition Plasma diagnostics Plasmas Radioactivity Plasma enhanced chemical vapor deposition
Subjects: Q Science > QC Physics
Divisions: Faculty of Science > Department of Physics
Depositing User: miss munirah saadom
Date Deposited: 16 Jul 2013 01:22
Last Modified: 02 Jan 2015 03:20

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