Chan, K.W. and Aspanut, Zarina and Rahman, S.A. (2013) Effect of rapid thermal annealing time on Au/SiOx film prepared by hot wire assisted plasma enhanced chemical vapour deposition technique. Materials Chemistry and Physics. ISSN 0254-0584,
Full text not available from this repository.Abstract
In this study, nanocomposite material consisting of silicon suboxide (SiOx ) film embedded with gold nanoparticles (Au NPs) was synthesized using hybrid technique combining hot wire evaporation and plasma enhanced chemical vapour deposition (PECVD) method. As prepared Au/SiOx films were rapid thermal annealed at constant temperature of 800 °C for different annealing times from 30 to 120 s. The use of tungsten filament for Au evaporation allowed the effective reduction of the silicon content. Depth profiling analysis confirmed the embedded in structure of Au/SiOx film. FESEM, UV/VIS/NIR and PL spectroscopy were utilized to study the structural and optical properties of annealed Au/SiOx film for different times. Embedded Au NPs diffused towards the surface of SiOx film agglomerate and increased in size with an increase in annealing time. Localized surface plasmon resonance (LSPR) peak induced by Au NPs in SiOx, which is dependent on annealing time, was clearly observed in optical spectra. Intensity and position of the PL peak located at 580 nm experienced a decrease and red-shift, as annealing time increased. © 2013 Elsevier B.V. All rights reserved.
Item Type: | Article |
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Funders: | UNSPECIFIED |
Additional Information: | Department of Physics, Faculty of Science Building, University of Malaya, 50603 Kuala Lumpur, MALAYSIA |
Uncontrolled Keywords: | Annealing, Chemical vapour deposition (CVD), Composite materials, Metals, Optical properties, Thin films |
Subjects: | Q Science > QC Physics |
Divisions: | Faculty of Science > Department of Physics |
Depositing User: | Miss Malisa Diana |
Date Deposited: | 25 Jul 2013 00:54 |
Last Modified: | 13 Mar 2019 03:55 |
URI: | http://eprints.um.edu.my/id/eprint/7523 |
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