Incorporation of indium oxide into the growth of multiwall carbon nanostructures via a solid–liquid–solid mechanism

Supangat, A. and Zulfiqar, H. and Kamarundzaman, A. (2013) Incorporation of indium oxide into the growth of multiwall carbon nanostructures via a solid–liquid–solid mechanism. Materials Letters, 112. pp. 29-31. ISSN 0167-577X, DOI https://doi.org/10.1016/j.matlet.2013.08.116.

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Abstract

In this study, the diffusion and incorporation of indium oxide nanostructure into the growth of multiwall carbon nanostructure (MWCN) is reported. MWCN was successfully grown on iron coated indium tin oxide (ITO) substrate via the chemical vapour deposition (CVD) of acetylene (C2H2). Indium oxide nanostructure that originated from ITO substrate is incorporated into the MWCN growth via a solid–liquid–solid mechanism. Under the present working temperature of 400 °C, indium oxide has been potentially diffused and incorporated into the MWCN growth which brings to the perception of carbon growth on particular substrate. The type of transparent conducting oxide substrate used in this study has much contribution to the MWCN growth.

Item Type: Article
Funders: UNSPECIFIED
Uncontrolled Keywords: Carbon materials; Diffusion; Chemical vapour deposition
Subjects: Q Science > Q Science (General)
Q Science > QC Physics
Divisions: Faculty of Science > Department of Physics
Depositing User: Ms. Juhaida Abd Rahim
Date Deposited: 09 Jan 2015 08:17
Last Modified: 09 Jan 2015 08:17
URI: http://eprints.um.edu.my/id/eprint/11795

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