Influence of substrate temperatures on structural, morphological and optical properties of RF-sputtered anatase Tio 2 films

Hasan, M.M. and Haseeb, A.S. Md. Abdul and Masjuki, Haji Hassan and Saidur, Rahman and Hamdi, M. (2010) Influence of substrate temperatures on structural, morphological and optical properties of RF-sputtered anatase Tio 2 films. Arabian Journal for Science and Engineering, 35 (1 C). pp. 147-156. ISSN 1319-8025

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In this investigation, TiO 2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 °C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO 2 films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), field emission Auger electron microscopy (FEAES), and UV-visible-NIR spectrophotometry. The XRD results reveal that all the as-deposited films possessing the anatase structure and crystallinity of TiO 2 films appears to deteriorate slightly at higher substrate temperatures. The crystallite size of the as-deposited films at different substrate temperatures is ~44 nm, which shows insignificant variation. AFM images exhibit a similar type of nodular morphology in the as-grown films. TiO 2 films deposited at different substrate temperatures exhibit high visible transmittance and a high refractive index ranging from 2.31 to 2.37 at a wavelength of 550 nm. The optical band gap of the films has been estimated to be in the range from 3.39 to 3.42 eV.

Item Type: Article
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Uncontrolled Keywords: Optical properties; Radio-Frequency (RF) sputtering; Structural properties; Titanium dioxide.
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
T Technology > TJ Mechanical engineering and machinery
Divisions: Faculty of Engineering
Depositing User: Mr Jenal S
Date Deposited: 05 Jul 2013 09:02
Last Modified: 18 Oct 2018 03:55

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