Hasan, M.M. and Haseeb, A.S. Md. Abdul and Masjuki, Haji Hassan and Saidur, Rahman and Abd Shukor, Mohd Hamdi (2010) Influence of substrate temperatures on structural, morphological and optical properties of RF-sputtered anatase Tio 2 films. Arabian Journal for Science and Engineering, 35 (1 C). pp. 147-156. ISSN 1319-8025,
Full text not available from this repository.Abstract
In this investigation, TiO 2 thin films were deposited on glass substrates at varying substrate temperatures from room temperature to 300 °C by radio-frequency (RF) magnetron sputtering at an elevated sputtering pressure of 3 Pa. As-deposited TiO 2 films were characterized by x-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), field emission Auger electron microscopy (FEAES), and UV-visible-NIR spectrophotometry. The XRD results reveal that all the as-deposited films possessing the anatase structure and crystallinity of TiO 2 films appears to deteriorate slightly at higher substrate temperatures. The crystallite size of the as-deposited films at different substrate temperatures is ~44 nm, which shows insignificant variation. AFM images exhibit a similar type of nodular morphology in the as-grown films. TiO 2 films deposited at different substrate temperatures exhibit high visible transmittance and a high refractive index ranging from 2.31 to 2.37 at a wavelength of 550 nm. The optical band gap of the films has been estimated to be in the range from 3.39 to 3.42 eV.
Item Type: | Article |
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Funders: | UNSPECIFIED |
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Uncontrolled Keywords: | Optical properties; Radio-Frequency (RF) sputtering; Structural properties; Titanium dioxide. |
Subjects: | T Technology > TA Engineering (General). Civil engineering (General) T Technology > TJ Mechanical engineering and machinery |
Divisions: | Faculty of Engineering |
Depositing User: | Mr Jenal S |
Date Deposited: | 05 Jul 2013 09:02 |
Last Modified: | 18 Oct 2021 02:34 |
URI: | http://eprints.um.edu.my/id/eprint/6767 |
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