Structural and mechanical properties of nanostructured TiO2 thin films deposited by RF sputtering

Haseeb, A.S. Md. Abdul and Hasan, M.M. and Masjuki, Haji Hassan (2010) Structural and mechanical properties of nanostructured TiO2 thin films deposited by RF sputtering. Surface and Coatings Technology, 205 (2). pp. 338-344. ISSN 0257-8972

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Official URL: https://doi.org/10.1016/j.surfcoat.2010.06.058

Abstract

This study mainly aims to evaluate the effects of substrate temperatures on the mechanical properties of TiO2 thin films deposited on glass substrates by radio-frequency (RF) magnetron sputtering. All titania films possess anatase structure having a nodular morphology. AES results reveal that Si and Na ions from glass diffuse into TiO2 films at higher substrate temperatures Micro-scratch and wear tests were conducted to evaluate their mechanical and tribological properties The adhesion critical loads of TiO2 films deposited at room temperature, 200 and 300 degrees C are found to be 1.51, 1.54 and 1.08 N. respectively Scratch hardness also Increases from 11.5 to 13 6 GPa with increasing temperature The wear track width decreases with substrate temperature indicating an improved wear resistance at higher temperatures (C) 2010 Elsevier B.V. All rights reserved.

Item Type: Article
Additional Information: Haseeb, A. S. M. A. Hasan, M. M. Masjuki, H. H.
Uncontrolled Keywords: Structural properties; Adhesion strength; Scratch hardness; Tribological properties
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Divisions: Faculty of Engineering
Depositing User: Mr. Mohammed Salim Abd Rahman
Date Deposited: 17 Apr 2013 02:39
Last Modified: 17 Oct 2018 01:16
URI: http://eprints.um.edu.my/id/eprint/5742

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