Controlled physical properties and growth mechanism of manganese silicide nanorods

Hamzan, Najwa Binti and Ng, Calvin Yi Bin and Sadri, Rad and Lee, Min Kai and Chang, Lieh-Jeng and Tripathi, Manoj and Dalton, Alan and Goh, Boon Tong (2021) Controlled physical properties and growth mechanism of manganese silicide nanorods. Journal of Alloys and Compounds, 851. ISSN 0925-8388, DOI https://doi.org/10.1016/j.jallcom.2020.156693.

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Abstract

In this study, manganese silicide (Mn5Si3) nanorods grown on c-Si/SiO2 substrate by chemical vapor deposition were investigated in detail, where the reaction temperature was varied from 750 to 1, 000 degrees C. The Mn5Si3 nanorods were successfully grown at reaction temperatures above 750 degrees C. The growth of these Mn5Si3 nanorods was followed by a direct vapor transport process, which strongly dependent on the vapor pressure of the Mn precursor. Manganese silicide particles were used as the templates to initiate the growth of these nanorods. The results showed that increasing the reaction temperature increased the delivery of Mn vapor to the substrate surface. The magnetic properties of the Mn5Si3 nanorods were also investigated. The properties of the nanorods were influenced by the formation of Mn-rich silicide phase at higher reaction temperatures. The magnetic result indicated that the nanorods were mainly in ferromagnetic characteristic. The saturation magnetization values at 4 and 300 K were found to be higher at a reaction temperature of 950 degrees C, with a value of 0.70 and 0.03 emu/g, respectively. The maximum coercivity was obtained for the nanorods prepared at reaction temperature of 950 degrees C, with a value of 100 Oe. (C) 2020 Published by Elsevier B.V.

Item Type: Article
Funders: Fundamental Research Grant Scheme[FP114-2019A], Newton Advanced Fellowship 2016 Round 2[NA16010], Newton Advanced Fellowship 2016 Round 2[IF003-2017], Newton Advanced Fellowship 2016 Round 2[IF003-2017A]
Uncontrolled Keywords: Transition metal silicides;Manganese silicide;Nanorods; Chemical vapor deposition;Ferromagnetic
Subjects: Q Science > QD Chemistry
T Technology > TA Engineering (General). Civil engineering (General)
Divisions: Faculty of Science
Depositing User: Ms Zaharah Ramly
Date Deposited: 21 Jul 2022 03:27
Last Modified: 21 Jul 2022 03:27
URI: http://eprints.um.edu.my/id/eprint/33958

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