Physical and dispersive optical characteristics of ZrON/Si thin-film system

Wong, Yew Hoong and Atuchin, V.V. and Kruchinin, V.N. and Cheong, K.Y. (2014) Physical and dispersive optical characteristics of ZrON/Si thin-film system. Applied Physics A, 115 (3). pp. 1069-1072. ISSN 0947-8396

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Official URL: https://doi.org/10.1007/s00339-013-7947-1

Abstract

To date, the complex evaluation of physical and dispersive optical characteristics of the ZrON/Si film system has yet been reported. Hence, ZrON thin films have been formed on Si(100) substrates through oxidation/nitridation of sputtered metallic Zr in N2O environment at 500, 700, and 900 ∘C. Physical properties of the deposited films have been characterized by X-ray diffractometry (XRD), Fourier transform infrared (FTIR) spectroscopy, reflection high-energy electron diffraction (RHEED), and spectroscopic ellipsometry (SE). It has been shown that ZrON/Si thin films without optical absorption can be prepared by oxidation/nitridation reaction in N2O environment at 700–900 ∘C.

Item Type: Article
Uncontrolled Keywords: Physical; Dispersive; Optical; Characteristics; ZrON/Si thin-film system
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Divisions: Faculty of Engineering
Depositing User: Ms. Juhaida Abd Rahim
Date Deposited: 13 Mar 2015 00:37
Last Modified: 06 Aug 2019 04:22
URI: http://eprints.um.edu.my/id/eprint/13018

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