Items where Author is "Khanis, N.H."

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Number of items: 7.

Article

Khanis, N.H. and Ritikos, R. and Kamal, S.A.A. and Rahman, S.A. (2017) Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature. Materials, 10 (2). p. 102. ISSN 1996-1944

Khanis, N.H. and Ritikos, R. and Chiu, W.S. and Haw, C.Y. and Rashid, N.M.A. and Chia, M.Y. and Khiew, P.S. and Rahman, S.A. (2017) SnO2 Nanoparticles Decorated 2D Wavy Hierarchical Carbon Nanowalls with Enhanced Photoelectrochemical Performance. Journal of Nanomaterials, 2017. pp. 1-11. ISSN 1687-4110

Rashid, N.M.A. and Haw, C.Y. and Chiu, W.S. and Khanis, N.H. and Rohaizad, A. and Khiew, P.S. and Rahman, S.A. (2016) Structural- and optical-properties analysis of single crystalline hematite (α-Fe2O3) nanocubes prepared by one-pot hydrothermal approach. CrystEngComm, 18 (25). pp. 4720-4732. ISSN 1466-8033

Mohd Daud, S.N.H. and Haw, C.Y. and Chiu, W.S. and Aspanut, Z. and Chia, M.Y. and Khanis, N.H. and Khiew, P. and Hamid, M.A.A. (2016) ZnO nanonails: Organometallic synthesis, self-assembly and enhanced hydrogen gas production. Materials Science in Semiconductor Processing, 56. pp. 228-237. ISSN 1369-8001

Rashid, N.M.A. and Ritikos, R. and Othman, M. and Khanis, N.H. and Gani, S.M.A. and Muhamad, M.R. and Rahman, S.A. (2013) Amorphous silicon carbon films prepared by hybrid plasma enhanced chemical vapor/sputtering deposition system: Effects of r.f. Power. Thin Solid Films, 529. pp. 459-463. ISSN 0040-6090

Khanis, N.H. and Ritikos, R. and Othman, M. and Abdul Rashid, N.M. and Ab. Gani, S.M. and Rahman, Saadah Abdul (2013) Catalyst free carbon nitride nanostructures prepared by rf-PECVD technique on hydrogenated amorphous carbon template. Materials Chemistry and Physics, 138 (2-3). pp. 514-518. ISSN 0254-0584

Othman, M. and Ritikos, R. and Khanis, N.H. and Rashid, N.M.A. and Gani, S.M.A. and Rahman, S.A. (2013) Effect of N2 flow rate on the properties of CNx thin films prepared by radio frequency plasma enhanced chemical vapor deposition from ethane and nitrogen. Thin Solid Films, 529. pp. 439-443. ISSN 0040-6090

This list was generated on Mon Jul 22 11:36:04 2019 +08.