Improving quantum microscopy and lithography via Raman photon pairs: II. analysis

Scully, M.O. and Ooi, Chong Heng Raymond (2004) Improving quantum microscopy and lithography via Raman photon pairs: II. analysis. Journal of Optics B-Quantum and Semiclassical Optics, 6 (8). pp. 816-820. ISSN 1464-4266

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Abstract

We show that by using the strongly correlated photon pairs generated in a Raman quantum erasure scheme (Scully M and Druhl K 1982 Phys. Rev. A 25 2208), it is possible to exceed the Rayleigh resolution limit of classical microscopy. The complete analysis of the underlying physics is given here. Further discussion of the physics and potential applications are presented in a companion paper (Scully M O 2004 Improving quantum microscopy and lithography via Raman photon pairs: I. Biological applications, submitted).

Item Type: Article
Additional Information: Department of Physics, Faculty of Science Building, University of Malaya, 50603 Kuala Lumpur, MALAYSIA
Uncontrolled Keywords: Raman; Quantum microscopy; Quantum lithography; Second order correlation; Time
Subjects: Q Science > QC Physics
Divisions: Faculty of Science > Dept of Physics
Depositing User: Miss Malisa Diana
Date Deposited: 08 Jul 2013 09:37
Last Modified: 09 Oct 2019 00:46
URI: http://eprints.um.edu.my/id/eprint/7928

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