Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering

Hasan, M.M. and Haseeb, A.S. Md. Abdul and Saidur, Rahman and Masjuki, Haji Hassan and Hamdi, M. (2009) Synthesis and annealing of nanostructured TiO2 films by radio-frequency magnetron sputtering. Journal of Applied Sciences, 9 (15). pp. 2815-2821. ISSN 1812-5654

Full text not available from this repository. (Request a copy)
Official URL:


In this investigation, anatase TiO2 thin films were deposited on glass substrates at room temperature by RF magnetron sputtering at an elevated sputtering pressure of 3 Pa. The TiO2 films deposited at room temperature were annealed at different temperatures up to 873°K for 1 h. The TiO2 films were characterized by X-Ray Diffraction (XRD), Field-Emission Scanning Electron Microscopy (FESEM), Atomic Force Microscopy (AFM) and UV-visible-NIR spectrophotometry. The XRD results reveal that the as-deposited film possess the anatase structure. Annealed TiO2 films show an insignificant change in crystallinity except of the fact that there is a slight increase for the film annealed at 600°C. The crystallite size increases from 44.5 to 48 nm with the increase of the annealing temperature. As-grown TiO2 film exhibits high visible transmittance with enhanced refractive index of 2.31 at a wavelength of 550 nm. The indirect optical band gaps of the as-deposited and annealed films have been estimated to be in the range of 3.39-3.42 eV. AFM observations reveal the compact and dense morphology of the as-deposited and annealed TiO2 thin films.

Item Type: Article
Uncontrolled Keywords: Morphology; Structural properties; Heat-mirror coatings; Optical properties
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
T Technology > TJ Mechanical engineering and machinery
Divisions: Faculty of Engineering
Depositing User: Mr Jenal S
Date Deposited: 08 Jul 2013 01:01
Last Modified: 25 Oct 2019 06:05

Actions (login required)

View Item View Item