Spreading profile of dopant solution on pre-sintered silica layers for selective area doping of integrated optic planar glass samples

Leong, W.C. and Tho, S.Y. and Law, A.W.P. and Chong, W.Y. and Pua, C.H. and Ahmad, Harith and Haseeb, A.S. Md. Abdul and Adikan, Faisal Rafiq Mahamd (2009) Spreading profile of dopant solution on pre-sintered silica layers for selective area doping of integrated optic planar glass samples. Thin Solid Films, 518 (1). pp. 378-382. ISSN 0040-6090

Full text not available from this repository. (Request a copy)
Official URL: https://doi.org/10.1016/j.tsf.2009.06.060

Abstract

The spread profile of potassium-permanganate (KMnO(4)) dye on a porous pre-sintered silica layer deposited via Flame Hydrolysis Deposition is presented. The work is aimed at controlling the dopant profile on the resulting glass layer for optically passive and active devices integration. KMnO(4) is used as it allows visual qualification of its spread on the soot layer. Pre-sintered silica layers allow for application of dopants into the glass matrix via adsorption and pore retention. Selective area doping is achieved by applying specific volumes of the dye onto pre-selected areas on the sample using a micropipette. Higher dye volumes applied would result in larger spread diameters. Furthermore, control of the spread is possible by heating the sample during the application of the dye. (C) 2009 Elsevier B.V. All rights reserved.

Item Type: Article
Additional Information: Leong, W. C. Tho, S. Y. Law, A. W. P. Chong, W. Y. Pua, C. H. Ahmad, H. Haseeb, A. S. M. A. Adikan, F. R. Mahamd
Uncontrolled Keywords: Integrated optics devices; Planar waveguide; Selective area doping techniques
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions: Faculty of Engineering
Depositing User: Mr. Mohammed Salim Abd Rahman
Date Deposited: 07 Feb 2013 00:24
Last Modified: 11 Oct 2018 01:48
URI: http://eprints.um.edu.my/id/eprint/4678

Actions (login required)

View Item View Item