Channel resolution enhancement through scalability of nano/micro-scale thickness and width of SU-8 polymer based optical channels using UV lithography

Amiri, Iraj Sadegh and Sorger, Volker J. and Ariannejad, Mohammad Mahdi and Ling, Xi and Ghasemi, M. and Yupapin, Preecha Promphan (2018) Channel resolution enhancement through scalability of nano/micro-scale thickness and width of SU-8 polymer based optical channels using UV lithography. Microsystem Technologies, 24 (3). pp. 1673-1681. ISSN 0946-7076

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Official URL: https://doi.org/10.1007/s00542-017-3581-8

Abstract

This paper reports on an approach for fabrication of micro-channels with nanometer thickness achieved by optimization of UV lithography processes. Rectangular micro-channels with a staple edge are fabricated over the surface of a silicon wafer substrate in which a sub-micron layer of diluted SU-8 thin film has been coated. The optimization of the process parameters includes the duration of a two-step pre- and post-baking process, UV exposure dosage, and finally chemical developing time with constant agitation. This produces recipe produces micro-channels with high contrast edges and thickness below 100 nm. The dimensions achieved using this approach has potential applications in sub-micron optical waveguides and nanoelectromechanical (NEMS) devices.

Item Type: Article
Uncontrolled Keywords: Baking process; Nanoelectromechanical devices; Nanometer thickness; Optical channels; Process parameters; Resolution enhancement; Silicon wafer substrates; UV lithography
Subjects: Q Science > QD Chemistry
T Technology > TK Electrical engineering. Electronics Nuclear engineering
T Technology > TP Chemical technology
Divisions: Deputy Vice Chancellor (Research & Innovation) Office > Photonics Research Centre
Depositing User: Ms. Juhaida Abd Rahim
Date Deposited: 20 Sep 2019 07:08
Last Modified: 20 Sep 2019 07:08
URI: http://eprints.um.edu.my/id/eprint/22485

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