Amiri, Iraj Sadegh and Sorger, Volker J. and Ariannejad, Mohammad Mahdi and Ling, Xi and Ghasemi, M. and Yupapin, Preecha Promphan (2018) Channel resolution enhancement through scalability of nano/micro-scale thickness and width of SU-8 polymer based optical channels using UV lithography. Microsystem Technologies, 24 (3). pp. 1673-1681. ISSN 0946-7076, DOI https://doi.org/10.1007/s00542-017-3581-8.
Full text not available from this repository.Abstract
This paper reports on an approach for fabrication of micro-channels with nanometer thickness achieved by optimization of UV lithography processes. Rectangular micro-channels with a staple edge are fabricated over the surface of a silicon wafer substrate in which a sub-micron layer of diluted SU-8 thin film has been coated. The optimization of the process parameters includes the duration of a two-step pre- and post-baking process, UV exposure dosage, and finally chemical developing time with constant agitation. This produces recipe produces micro-channels with high contrast edges and thickness below 100 nm. The dimensions achieved using this approach has potential applications in sub-micron optical waveguides and nanoelectromechanical (NEMS) devices.
| Item Type: | Article |
|---|---|
| Funders: | UNSPECIFIED |
| Uncontrolled Keywords: | Baking process; Nanoelectromechanical devices; Nanometer thickness; Optical channels; Process parameters; Resolution enhancement; Silicon wafer substrates; UV lithography |
| Subjects: | Q Science > QD Chemistry T Technology > TK Electrical engineering. Electronics Nuclear engineering T Technology > TP Chemical technology |
| Divisions: | Deputy Vice Chancellor (Research & Innovation) Office > Photonics Research Centre |
| Depositing User: | Ms. Juhaida Abd Rahim |
| Date Deposited: | 20 Sep 2019 07:08 |
| Last Modified: | 20 Sep 2019 07:08 |
| URI: | http://eprints.um.edu.my/id/eprint/22485 |
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