Logan, D.F. and Murray, K.J. and Ackert, J.J. and Velha, P. and Sorel, M. and De La Rue, R.M. and Jessop, P.E. and Knights, A.P. (2010) Analysis of resonance enhancement in defect-mediated silicon micro-ring photodiodes operating at 1550 nm. Journal of Optics A, 13 (12).
Full text not available from this repository.Abstract
The resonant defect-enhanced photodiode has received recent attention for its potential use in silicon photonic applications such as wavelength division multiplexing (WDM). Here, we analyze the nature of the resonant enhancement in micro-ring photodiodes by exploring the roles of defect content and ring geometry. Through the use of post-processing to gradually reduce the defect concentration, we demonstrate an optimized peak responsivity of 160 mA W-1 in a ring resonator having a linewidth of 0.12 +/- 0 : 01 nm and 12.8 +/- 0.9 dB extinction. We also show that the responsivity is insensitive to ring radius in the range between 10 mu m and 20 mu m, demonstrate the influence of a drop port waveguide on the resonant enhancement, and discuss design methodologies to enhance performance further.
| Item Type: | Article |
|---|---|
| Funders: | UNSPECIFIED |
| Subjects: | Q Science > Q Science (General) R Medicine |
| Depositing User: | MR Faizal II H |
| Date Deposited: | 09 Nov 2015 02:09 |
| Last Modified: | 09 Nov 2015 02:09 |
| URI: | http://eprints.um.edu.my/id/eprint/14692 |
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