Shahid, M. and Mazhar, M. and Hamid, M. and Brien, P.O' and Malik, M.A. and Helliwell, M. (2010) Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere. Applied Organometallic Chemistry, 24 (10). pp. 714-720. ISSN 0268-2605,
Full text not available from this repository.Abstract
Crystalline copper films were deposited by aerosol-assisted chemical vapor deposition (AACVD) in the absence of hydrogen from two newly synthesized complexes [Cu(deae)(TFA)](4)center dot 1.25THF (1) and [Cu(4)(OAc)(6)(bdmap)(2)(H(2)O)(2)]center dot 4H(2)O (2) [deae = N, N-diethylaminoethanolate, TFA = trifloroacetate, OAc = acetate and bdmap = 1,3-bis(dimethylamino)-2-propanolato]. These precursors were prepared in high yield using mixed ligands and crystallized in tetragonal and triclinic crystal systems with space groups 14(1)/a and P-1. Complexes 1 and 2 thermally decomposed at 290 and 250 degrees C, respectively, to yield copper films which were characterized by SEM/EDX for their morphology and composition and PXRD for their crystallinity and phase. These films have smooth morphologies with particle sizes within the range of 0.3-0.6 mu m and may find applications in fabrication of ultralarge-scale integrated circuits. Copyright (C) 2010 John Wiley & Sons, Ltd.
| Item Type: | Article |
|---|---|
| Funders: | UNSPECIFIED |
| Uncontrolled Keywords: | Homometallic copper complexes; X-ray structure; AACVD; XRD; copper films |
| Subjects: | Q Science > Q Science (General) |
| Depositing User: | Mr Faizal 2 |
| Date Deposited: | 20 Jan 2015 03:02 |
| Last Modified: | 20 Jan 2015 03:02 |
| URI: | http://eprints.um.edu.my/id/eprint/12274 |
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