Au/nc-Si:H core–shell nanostructures prepared by hot wire assisted plasma enhanced chemical vapor deposition technique

Chan, K.W. and Goh, B.T. and Abdul Rahman, S. and Aspanut, Z. (2012) Au/nc-Si:H core–shell nanostructures prepared by hot wire assisted plasma enhanced chemical vapor deposition technique. Surface and Coatings Technology. ISSN 0257-8972

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Abstract

In this study, Au film was embedded in Si:H film on quartz substrate with and without an SiOx layer by using the hot wire assisted plasma enhanced chemical vapor deposition (HW-PECVD) technique. The as-prepared Au/Si:H films were post-thermally annealed at 800 °C in nitrogen ambient in order to initiate the growth of Au NPs. The annealed Au/a-Si:H film deposited on quartz substrate without an SiOx layer showed the formation of well-distributed and spherical Au NPs. Formations of Au/nc-Si:H core shell nanostructures were observed on annealed film deposited on quartz substrate with an SiOx layer. XRD and micro-Raman scattering spectra revealed that the degree of crystallinity of nc-Si:H was dependent on the annealing temperature and interaction between a-Si:H film and SiOx layer. Optical spectra showed that the Au NPs on annealed films deposited on quartz substrate without an SiOx layer exhibited prominent SPR peak while annealed Au/nc-Si:H core shell nanostructures showed increased reflectance of light in the visible region.

Item Type: Article
Additional Information: Department of Physics, Faculty of Science, University of Malaya
Uncontrolled Keywords: Au/nc-Si:H core shell nanostructures; Silicon suboxide; HW-PECVD
Subjects: Q Science > QC Physics
Divisions: Faculty of Science > Dept of Physics
Depositing User: Ms. Wati Yusuf
Date Deposited: 05 Nov 2014 00:56
Last Modified: 05 Nov 2014 00:56
URI: http://eprints.um.edu.my/id/eprint/10637

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